SALD, the innovator in Spatial ALD technology Atomic layer deposition (ALD) is a technology that produces very thin, conformal films with control of thickness and composition at atomic level. ALD is best known for the production of computer chips. The disadvantage is that it works slowly; each layer takes relatively much time. In 2008 TNO scientists developed a brilliant solution for this: Spatial ALD. With this new technology TNO was able to increase the production speed 5 to 10 times, while the coating quality remained the same.
