Experience

PDF Solutions

• United States
• Software Development
• 300 - 400 Employee

• Exensio Application Engineer

  • Apr 2019 - Present

• DOE Owner

  • Jul 2015 - Apr 2022

  Content owner for vaiour FEOL/MOL BEOL test-sites for various technologies: 22nm, 14nm, 7nm. ---Define defectivity contents to monitor and improve baseline yields. ---Define various macros to monitor parametric and systematic contents: ---Create test macros for new failmodes. ---Simplify macros for easy design, testing or analysis. ---Prioritize DOE contents based on failmodes understanding and client needs.

• Senior Consultant

  • Jan 2012 - Jul 2015

  22nm FEOL/MOL characterization support: interface with integration/process/device/metrology team to improve yield and fix systematic yield detractors. 22nm overall yield prioritization and roadmap through PDF patented designs. product bin-sort and data analysis and correlation to yield/parametric/device/metrology to find possible yield detractors. test macro DOE, implementation and analysis to monitor key yield detractors with enough observability.

• Application Engineer

  • May 2005 - Jan 2012

  Research and Development: CV DOE and design research. Research and development: scribeCV application and analysis methodology. Research and development: CMOS device variation characterization and breakdown. Silicon to spice calibration methodology development. Testing: Manual and automatic probe testing. Application: Yield Ramp Simulator application and development. Custom scripts to enable a variety of layout attributes extraction. Application and Research/development: SRAM… Show more Research and Development: CV DOE and design research. Research and development: scribeCV application and analysis methodology. Research and development: CMOS device variation characterization and breakdown. Silicon to spice calibration methodology development. Testing: Manual and automatic probe testing. Application: Yield Ramp Simulator application and development. Custom scripts to enable a variety of layout attributes extraction. Application and Research/development: SRAM extractions and micro-events breakdown by layer/bits. Compact SRAM repair models. Application: Fail-rate modelling.



Oak Ridge National Laboratory

• Research Associate

  • Jul 2002 - May 2005

  e-beam lithography using nano-emitters nano device fabrication in clean room nano materials characterization using SEM/TEM/AFM,etc nano device packaging and characterization using wire-bonder, e-test, photo-absorption,etc. e-beam lithography using nano-emitters nano device fabrication in clean room nano materials characterization using SEM/TEM/AFM,etc nano device packaging and characterization using wire-bonder, e-test, photo-absorption,etc.