Experience

Flisom

• Switzerland
• Renewable Energy Semiconductor Manufacturing
• 1 - 100 Employee

• Process Manager

  • Oct 2015 - Present

  planning and execution of the industrial vapor deposition of a semi-conductor CuInGaSe2 thin film. Continiously improving of the process controll. Developping new processes. Analysis of process data (>100 process parameters) and correlating them with IV parameter of resulting solar modules. planning and execution of the industrial vapor deposition of a semi-conductor CuInGaSe2 thin film. Continiously improving of the process controll. Developping new processes. Analysis of process data (>100 process parameters) and correlating them with IV parameter of resulting solar modules.



Helmholtz-Zentrum Berlin

• Germany
• Research Services
• 400 - 500 Employee

• Forscher (Post-Doc)

  • Jan 2010 - Aug 2015

  Collaboration in differenct projects (ENG53 ThinErgy, COMCIGS)Research on RuS2 as catalyst for light-induced water splitting.Research on CIGS as absorber for thin film solar cells. Responsible for PVD chamber.Organisation and execution of beamtimes at synchrotron sources HASYLAB and BESSY.Thin film characterisation using (enegy-dispersive) X-Ray diffraction, scanning-electron microscopy, time-resolved photo-luminescence. Elelectro-chemical characterisations.Responsible for physical vapor deposition chamber (processing and maintenance)



Helmholtz-Zentrum Berlin

• Germany
• Research Services
• 400 - 500 Employee

• PHD

  • Jan 2006 - Aug 2009

  Deposition of WS2 and MoS2 thin films by reactive magnetron sputtering. Characterisation using among others (enegy-dispersive) X-Ray diffraction, scanning-electron microscopy, atomic-force microscopy, UV/VIS.Organisation and execution of beamtimes at synchrotron source HASYLAB (EDXRD). Responsible for magnetron-sputtering chamber (engeneering, processing and maintenance) Deposition of WS2 and MoS2 thin films by reactive magnetron sputtering. Characterisation using among others (enegy-dispersive) X-Ray diffraction, scanning-electron microscopy, atomic-force microscopy, UV/VIS.Organisation and execution of beamtimes at synchrotron source HASYLAB (EDXRD). Responsible for magnetron-sputtering chamber (engeneering, processing and maintenance)



RICOH R&D Japan

• Intern in R&D department

  • Jul 2004 - Sep 2004

  optical simulations for the development of a projector. optical simulations for the development of a projector.