Experience

Win Semiconductors Corp. 穩懋半導體股份有限公司
• United States
• Semiconductors
• 200 - 300 Employee
• Deputy Director

  • Sep 2020 - Present


WIN semiconductors

• United States
• Semiconductors
• 200 - 300 Employee

• Lithography department manager

  • Jan 2011 - Aug 2020

  In charge of Litho department for new 6" production line setup for FAB-B. To catch up and meet schedule of FAB-B capacity ramping up from 3K to 12K. Survey and evaluate used stepper to catch up and meet original ramping up schedule. And 140 million NTD cost saving. (70 million per stepper) Cost down project: 5.8 million NTD for cassette evaluation. Evaluated, examined and implemented PBT cassette to replace PEEK cassette for wafer storage. In charge of Litho department for new 6" production line setup for FAB-B. To catch up and meet schedule of FAB-B capacity ramping up from 3K to 12K. Survey and evaluate used stepper to catch up and meet original ramping up schedule. And 140 million NTD cost saving. (70 million per stepper) Cost down project: 5.8 million NTD for cassette evaluation. Evaluated, examined and implemented PBT cassette to replace PEEK cassette for wafer storage.



Nanya Technology

• Taiwan
• Semiconductors
• 300 - 400 Employee

• Photo Process Section mamnger

  • Apr 2007 - Jan 2011

  To set up and build up first 12" FAB for NTC. I am in charge of scanner (Nikon / Canon / ASML) / overlay (KLA Tencor), process (immersion / ArF / KrF) and key projects inclduing mask and track (PR related), and handle over 25 people. To set up and build up first 12" FAB for NTC. I am in charge of scanner (Nikon / Canon / ASML) / overlay (KLA Tencor), process (immersion / ArF / KrF) and key projects inclduing mask and track (PR related), and handle over 25 people.



Qimonda

• Semiconductor Manufacturing
• 700 & Above Employee

• Photo specialist

  • Oct 2005 - Apr 2007

  I was worked at 12" FAB of Qimonda and in charge of scanner, overlay and process control.(ASML scanner / KLA overlay) I was worked at 12" FAB of Qimonda and in charge of scanner, overlay and process control.(ASML scanner / KLA overlay)



Nanya Technology Corporation (NTC)

• • May 2002 - Oct 2005

  I was in charge of scanner (Nikon / Canon), overlay (KLA tencor) and crtitcal process (0.14um / 0.11um) control and key projects, and handle over 8 people.

• • Dec 2001 - May 2002

  I was in charge of scanner (Nikon), overlay (KLA tencor) and crtitcal process (0.175um / 0.14) control and key project.

• • Dec 1999 - Dec 2001

  To set up and build up 8" FAB for NTC. I was in charge of scanner (Nikon), overlay (KLA tencor) and crtitcal process (0.2 / 0.175um) control.