Ken Sotoodeh

Sr. Process Engineer at SVTC
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Contact Information
us****@****om
(386) 825-5501
Location
Austin, Texas, United States, US

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5.0

/5.0
/ Based on 2 ratings
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Michael Kwon

Ken is a very diligent engineer. He is someone I respect and trust. He works well with others through cooperation and collaboration. Always willing to lend a hand even if he is inundated with his own work. Ken will ensure follow through until issues are resolved. I highly recommend Ken.

Scott Bisland

I have known Ken for several years. He is open minded and detail oriented , yet has the ability to look at the big picture. When Ken says something would be done, you never have to go back and check, because it was done. Excellent Process Engineer and highly recomended.

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Experience

    • United States
    • Semiconductor Manufacturing
    • 1 - 100 Employee
    • Sr. Process Engineer
      • 2011 - Present
    • Sr. Etch Process engineer
      • Jan 2007 - Nov 2008

      Specializing in dry etching and wet clean/ strip operations, including: process sustaining, and development, yield enhancement, characterization and implementation of new processes and equipment, production training, writing specifications, process control, and optimizations. Specializing in dry etching and wet clean/ strip operations, including: process sustaining, and development, yield enhancement, characterization and implementation of new processes and equipment, production training, writing specifications, process control, and optimizations.

    • United States
    • Civic and Social Organizations
    • Sr. Etch process Engineer
      • 2001 - 2007
    • Türkiye
    • Automation Machinery Manufacturing
    • Sr. Process Engineer
      • 2001 - 2006
    • Sr. Etch Process Engineer
      • Aug 1999 - Apr 2001

      Responsible for process sustaining and development for Spacer etch (Triangular, and Square), ARC etch, SALI (Self Aligned Local Interconnect) and, LI contact, REB (Resist Etch Back), and Passivation etch, at Motorola’s state of the art 0.15 technology facility. Responsible for process sustaining and development for Spacer etch (Triangular, and Square), ARC etch, SALI (Self Aligned Local Interconnect) and, LI contact, REB (Resist Etch Back), and Passivation etch, at Motorola’s state of the art 0.15 technology facility.

    • Semiconductor Manufacturing
    • 400 - 500 Employee
    • Staff Process Engineer
      • 1989 - 1999

    • Sr. Etch process Engineer
      • 1989 - 1999

Education

  • California Polytechnic State University-San Luis Obispo
    BS, Electrical Engineering
    1969 - 1971

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